Calibration of high speed loader to substrate transport system

ABSTRACT

In a first aspect, a first method of calibrating a substrate carrier loader to a moving conveyor is provided. The first method includes the steps of (1) providing a substrate carrier loader adapted to load substrate carriers onto a moving conveyor; (2) aligning the substrate carrier loader to the moving conveyor; and (3) calibrating the substrate carrier loader to the moving conveyor. Numerous other aspects are provided.

This application claims priority to U.S. Provisional Patent ApplicationSer. No. 60/520,180, filed Nov. 13, 2003, entitled “CALIBRATION OF HIGHSPEED LOADER TO SUBSTRATE TRANSPORT SYSTEM”, the content of which ishereby incorporated herein by reference in its entirety for allpurposes.

CROSS REFERENCE TO RELATED APPLICATIONS

The present application is related to the following commonly-assigned,co-pending U.S. patent applications, each of which is herebyincorporated herein by reference in its entirety for all purposes:

-   -   U.S. patent application Ser. No. 10/650,310, filed Aug. 28, 2003        and titled “System For Transporting Substrate Carriers”        (Attorney Docket No. 6900);    -   U.S. patent application Ser. No. 10/650,480, filed Aug. 28, 2003        and titled “Substrate Carrier Handler That Unloads Substrate        Carriers Directly From a Moving Conveyor” (Attorney Docket No.        7676);    -   U.S. patent application Ser. No. 10/764,982, filed Jan. 26, 2004        and titled “Methods and Apparatus for Transporting Substrate        Carriers” (Attorney Docket No. 7163); and    -   U.S. patent application Ser. No. 10/764,820, filed Jan. 26,        2004, and titled “Overhead Transfer Flange and Support for        Suspending Substrate Carrier” (Attorney Docket No. 8092).

FIELD OF THE INVENTION

The present invention relates to semiconductor device manufacturing, andmore particularly to the calibration of a high speed loader to asubstrate transport system.

BACKGROUND OF THE INVENTION

Manufacturing of semiconductor devices typically involves performing asequence of procedures with respect to a substrate such as a siliconwafer, a glass plate, a mask, a reticule, etc. These steps may includepolishing, deposition, etching, photolithography, heat treatment, and soforth. Usually a number of different processing steps may be performedin a single processing system “tool” which includes a plurality ofprocessing chambers. However, it is generally the case that otherprocesses are required to be performed at other processing locationswithin a fabrication facility, and it is accordingly necessary thatsubstrates be transported within the fabrication facility from oneprocessing location to another. Depending upon the type of semiconductordevice to be manufactured, there may be a relatively large number ofprocessing steps required, to be performed at many different processinglocations within the fabrication facility.

It is conventional to transport substrates from one processing locationto another within substrate carriers such as sealed pods, cassettes,containers and so forth. It is also conventional to employ automatedsubstrate carrier transport devices, such as automatic guided vehicles,overhead transport systems, substrate carrier handling robots, etc., tomove substrate carriers from location to location within a fabricationfacility or to transfer substrate carriers from or to a substratecarrier transport device.

Previously incorporated U.S. patent application Ser. No. 10/650,310,filed Aug. 28, 2003, entitled “System for Transporting SemiconductorSubstrate Carriers” (Attorney Docket No. 6900), discloses a substratecarrier transport system that includes a conveyor for substrate carriersthat is intended to be constantly in motion during operation of thefabrication facility which it serves. The constantly moving conveyor isintended to facilitate transportation of substrates within thefabrication facility.

Previously incorporated U.S. patent application Ser. No. 10/650,480filed Aug. 28, 2003, entitled “Substrate Carriers Handler that UnloadsSubstrate Carriers Directly from a Moving Conveyor” (Attorney Docket No.7676), discloses a high speed substrate carrier transfer stationequipped with a substrate carrier handler for unloading substratecarriers from, and loading substrate carriers onto such a substratecarrier transport system. In one embodiment, the substrate carriertransfer station comprises a substrate carrier handler that includes ahorizontal guide that is moveable along parallel vertical guides, and anend effector that is moveable horizontally along the horizontal guide.To unload a substrate carrier from a moving conveyor that transportssubstrate carriers and that passes adjacent to the high speed substratecarrier transfer station, the end effector is moved along the horizontalguide at a velocity that substantially matches that of the substratecarrier (e.g., by substantially matching substrate carrier speed in ahorizontal direction). The end effector may also substantially match aposition of the substrate carrier while substantially matching avelocity of the substrate carrier. When so matching, the end effectormay be raised by moving the horizontal guide upwardly along the verticalguides, so that the end effector contacts and lifts the substratecarrier from the substrate carrier transporter. A substrate carrier maysimilarly be loaded onto the moving substrate carrier conveyor bysubstantially matching end effector and conveyor velocities (and/orpositions) during loading.

Efficiency gains may be achieved via increasing the common speed of theend effector and the substrate carrier during such transfers, whichunderscores a need for precise and efficient interaction betweenseparately supported and separately driven portions of the system.

SUMMARY OF THE INVENTION

In a first aspect, a first method of calibrating a substrate carrierloader to a moving conveyor is provided. The first method includes thesteps of (1) providing a substrate carrier loader adapted to loadsubstrate carriers onto a moving conveyor; (2) aligning the substratecarrier loader to the moving conveyor; and (3) calibrating the substratecarrier loader to the moving conveyor.

In a second aspect, a second method of calibrating a substrate carrierloader to a moving conveyor is provided. The second method includes thesteps of (1) providing a substrate carrier loader adapted to loadsubstrate carriers onto a moving conveyor; (2) establishing a footprintposition of the substrate carrier loader relative to the movingconveyor; (3) establishing a level of the substrate carrier loader atthe footprint position; and (4) establishing a frame height of thesubstrate carrier loader at the footprint position. The second methodfurther includes, if needed, (a) adjusting a pitch of a travel path ofan end effector of the substrate carrier loader based on a pitch of themoving conveyor; (b) adjusting a roll of the travel path of the endeffector of the substrate carrier loader; (c) adjusting a lateralposition of the travel path of the end effector of the substrate carrierloader based on a lateral position of the moving conveyor; or (d)adjusting a yaw of the travel path of the end effector of the substratecarrier loader. Numerous other aspects are provided in accordance withthese and other aspects of the invention.

Other features and aspects of the present invention will become morefully apparent from the following detailed description, the appendedclaims and the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a side schematic view of a wafer transport processing systemprovided in accordance with the present invention.

FIG. 1B is a front schematic view of the system of FIG. 1A.

FIG. 1C is a top schematic view of the system shown in FIG. 1B.

FIG. 2 is a side schematic view of the wafer carrier transport system ofFIGS. 1A-1C that depicts an embodiment of a detectable feature.

FIG. 3 is a side schematic view of an upper portion of the wafer carrierprocessing system of FIGS. 1A-1C that shows an embodiment of ahigh-speed loader that includes a launch sensor assembly.

FIG. 4 is a side schematic view of the high-speed wafer carrier handlerof a high-speed loader that illustrates an exemplary embodiment of amounting location of FIGS. 1A-1C.

FIG. 5 is a schematic side view illustrating an end effector rising tomate with a wafer carrier as the wafer carrier is supported by the wafercarrier transport system of FIGS. 1A-1C.

FIG. 6 illustrates a flowchart of an exemplary process for installing ahigh-speed loader as part of an overall wafer carrier processing systemin accordance with an embodiment of the present invention.

FIGS. 7A-7B illustrate a flowchart of an exemplary process for aligninga high-speed loader (FIG. 1A) to the factory interface of a waferprocessing tool (FIG. 1C) and to a wafer carrier transport system (FIG.1B) in accordance with an embodiment of the present invention.

FIG. 8 illustrates a flowchart of an exemplary process for adjusting theorientation of a horizontal guide (FIG. 1A) of a high-speed wafercarrier handler so that the horizontal guide exhibits pitch that matchesthe pitch of a wafer carrier transport system in accordance with anembodiment of the present invention.

FIG. 9 illustrates a flowchart of an exemplary process for adjusting they-axis position and yaw orientation of a horizontal guide (FIG. 1C) of ahigh-speed wafer carrier handler of a high-speed loader in accordancewith an embodiment of the present invention.

FIG. 10A is a schematic front view of the horizontal guide and the endeffector of FIGS. 1A-1C.

FIG. 10B is a schematic front view that is similar to FIG. 10A, exceptthat in the view of FIG. 10B the pitch of a first path portion of awafer carrier transport system and the pitch of a horizontal guidematch.

FIG. 11 is a schematic side view of the high-speed loader of FIGS. 1A-1Cwherein a side-looking sensor is adapted to detect a detectable featureof and/or associated with a wafer carrier transport system.

FIGS. 12A-12B illustrates a horizontal guide of an high-speed loaderbefore and after, respectively, adjustment of a y-axis position and/oryaw of the horizontal guide relative to a wafer carrier transportsystem.

FIG. 13 is a schematic side view of the high-speed loader of FIGS.1A-1C, wherein an upward-looking sensor is adapted to detect adetectable feature of or associated with a wafer carrier transportsystem.

FIG. 14 illustrates a flow chart of an exemplary process forestablishing an elevation of an end effector of a high-speed loaderrelative to a wafer carrier transport system as a “vertical zero” forthe end effector in accordance with an embodiment of the presentinvention.

FIG. 15 illustrates a flow chart of an exemplary process forestablishing a “horizontal launch offset” of an end effector of ahigh-speed loader relative to a launch sensor (FIG. 3) in accordancewith an embodiment of the present invention.

FIGS. 16 and 17 are schematic side views of the high-speed loader ofFIGS. 1A-1C wherein a side-looking sensor is adapted to detect adetectable feature of and/or associated with a wafer carrier transportsystem.

FIG. 18 is a perspective schematic view of a sensor assembly adapted todetect detectable features of a shelf or other storage location andgenerate signals for determining a position of the shelf and/or dockingstation in the x-z plane.

FIG. 19 is a top schematic view of a shelf support panel having twostorage locations, and of an end effector, a horizontal guide, and apath through which the horizontal guide is adapted to guide the endeffector.

DETAILED DESCRIPTION

In accordance with at least one aspect of the present invention, ahigh-speed substrate carrier transfer station (with or without substratecarrier storage) is aligned and calibrated to a substrate carriertransport system. The substrate carrier hand-off function of thetransfer station may then be tested, and the high-speed transfer stationis placed into service for at least that function.

In accordance with another aspect of the present invention, in additionto being aligned to the substrate carrier transport system, thehigh-speed transfer station may also be aligned and calibrated to afactory interface of a substrate loading station that transferssubstrates back and forth between the transfer station and one or moreloadlocks of a substrate processing tool for processing of thesubstrates. In accordance with a further aspect of the invention, theabove alignment, calibration and testing may be performed while thesubstrate carrier transport system is in motion and transportingsubstrate carriers. In accordance with a still further aspect of theinvention, the above alignment, calibration and testing may be performedwithout requiring any contact with the substrate carrier transportsystem prior to the high-speed substrate carrier transport station beingplaced into service (whether or not the substrate carrier transportsystem is in motion).

System Apparatus Overview

FIG. 1A is a side schematic view of a wafer transport processing system101. FIG. 1B is a front schematic view of the system 101 of FIG. 1A.Note the loading station of the system 101 has both docking stations andstorage locations, making the loading station both a wafer loading andwafer carrier storage station. FIG. 1C is a top schematic view of thesystem 101 shown in FIG. 1B. The following is a basic description of thesystem 101 which is best understood when read with reference to FIGS.1A-1C.

The system 101 comprises a wafer processing tool 103, a wafer carriertransport system 105 (or WCTS), and a high-speed loader 107 (or HSL).The wafer carrier transport system 105 is adapted to transport aplurality of wafer carriers 109 in the +x direction through a first path111 within at least a portion of a manufacturing facility 113 (FIG. 1A).Although not necessary, preferably, the first path portion 111 throughwhich the wafer carrier transport system 105 is adapted to transportwafer carriers 109 is elevated above a floor 115 of the manufacturingfacility 113 and is straight and parallel to the horizon. Alsopreferably, the high-speed loader 107 is situated on (e.g., resting on)the floor 115 of the manufacturing facility 113, and is adapted toremove wafer carriers 109 from, and load wafer carriers 109 onto, thewafer carrier transport system 105, preferably while the wafer carriertransport system 105 is in motion.

As shown in FIG. 1C, the wafer processing tool 103 may comprise aplurality of radially-arranged wafer processing chambers 117, a robot119 adapted to insert wafers into each wafer processing tool 117 andremove wafers from each wafer processing tool 117, at least one loadlock121, and a factory interface 123 (or FI). The factory interface 123comprises a robot 125 adapted to transfer wafers between the high-speedloader 107 and a loadlock 121 of the wafer processing tool 103 via aplurality of docking stations 127 of the factory interface 123.

The factory interface 123 also may comprise at least one datum plate 129adapted to provide a datum surface 131 that may be substantially flat,perpendicular to the horizon, and parallel to the first path portion 111through which the wafer carrier transport system 105 is adapted totransport the wafer carriers 109. The factory interface 123 may compriseat least one storage location support panel 133 fastened to the datumsurface 131 of the datum plate 129, and a plurality of stationary wafercarrier storage locations 135, each wafer carrier storage location 135being mounted to a shelf support panel 133 such that each wafer carrierstorage location 135 occupies a position either above, beside, or belowthe preferably centrally-located docking stations 127. A gap 137 mayexist in the support panel 133 to permit each docking station 127 toextend out from the datum plate 129 and toward the high-speed loader107, preferably in a direction that is substantially perpendicular tothe datum surface 131. Each wafer carrier storage location 135 mayextend outward from the support panel 133 and toward the high-speedloader 107, also preferably in a direction that is substantiallyperpendicular to the datum surface 131.

The first path portion 111 through which the wafer carrier transportsystem 105 is adapted to transport wafer carriers 109 may form a portionof a longer continuous path (not shown) through the manufacturingfacility 113 that may comprise a substantially horizontally-orientedloop (not shown). In at least one embodiment, the wafer carriertransport system 105 comprises a relatively thin vertically-orientedband 139. The band 139 of the wafer carrier transport system 105 issupported at or near a top portion 141 of the band 139 (e.g., via ahorizontally-oriented flange (not shown) that can comprise a foldedportion of the band 139, a separate part fastened to the band 139 or asimilar configuration). Only a portion of the band 139, which preferablycomprises a continuous horizontally-oriented loop (not shown), is shownin FIGS. 1A-1C. The wafer carrier transport system 105 may be adapted tomove and guide the band 139 such that the band 139 rotates through ahorizontally-oriented loop (not shown) that remains fixed relative tothe floor 115 of the manufacturing facility 113.

Each wafer carrier 109 may be adapted to be supported by and to dependfrom the band 139 of the wafer carrier transport system 105. The wafercarrier transport system 105 may comprise a plurality of wafer carriersupport members 143 coupled to the band 139, preferably in a seriesarrangement along the length of the band 139. Each wafer carrier supportmember 143 is adapted to hold a wafer carrier 109 in a discrete locationalong the length of the band 139, whether the band 139 is moving ormotionless. Each wafer carrier support member 143 may comprise a bandinterface portion 145 via which the wafer carrier support member 143 isadapted to couple to the band 139 of the wafer carrier transport system105, preferably at or near a bottom portion 147 of the band 139. Eachwafer carrier support member 143 may also comprise a flange supportelement 149 adapted to receive and retain a flange 151 of a wafercarrier 109.

The flange support element 149 of the wafer carrier support member 143is preferably centered beneath the bottom portion 147 the band 139.

The wafer carrier transport system 105 further comprises a plurality ofdetectable features 153 (FIG. 1B) located at discrete fixed positionsalong the length of the band 139. Preferably, the detectable features153 are arranged in series along the band 139. Each detectable feature153 may be detected by one or more sensors as described below (e.g.,non-contact or remote-sensors). Each detectable feature 153 is furtherpreferably positioned along the length of the band 139 so as tocorrespond to a position of a particular band interface portion 145 (ofa particular wafer carrier support member 143) of the wafer carriertransport system 105. If the band interface portion 145 to which aparticular detectable feature 153 corresponds also supports a wafercarrier 109, the position of that particular detectable feature 153shall then also correspond to the position of the wafer carrier 109supported by the band 139.

The above-referenced high-speed loader 107 comprises a high-speed wafercarrier handler 154 adapted to remove wafer carriers 109 from, and toload wafer carriers 109 onto, wafer carrier support members 143 of thewafer carrier transport system 105 (e.g., while the band 139 of thewafer carrier transport system 105 is in motion, such as while the wafercarrier transport system 105 is transporting other wafer carriers 109 inthe +x direction through at least the first path portion 111). Thehigh-speed wafer carrier handler 154 also may place wafer carriers 109on, and remove wafer carriers 109 from: (1) a wafer carrier storagelocation 135; and/or (2) a docking station 127 of the HSL 107.

The high-speed loader 107 further comprises a frame 157 adapted tosupport the high-speed wafer carrier handler 154 and establish andmaintain a suitable orientation of the high-speed wafer carrier handler154 such that the high-speed wafer carrier handler 154 can perform theabove-described wafer carrier placement and removal functions smoothlyand repeatably. To this end, the frame 157 may comprise interconnectedbeams 159 which are relatively stiff and strong so as to reduce thepotential for load-induced flexure in the frame 157.

The frame 157 may be adapted to be adjusted as to overall y-axiselevation relative to the wafer carrier transport system 105 suspendedabove the high-speed loader 107. To this end, the frame 157 may compriseelevation adjusting apparatus, such as a plurality ofelevation-adjusting legs 161 shown in FIGS. 1A-1B. Each leg 161preferably comprises a limb 163 and a foot 165, the limb 163 beingadapted to selectably adjustably extend out from within a beam 159 ofthe frame 157, and the foot 165 being adapted to be seated on the floor115 of the manufacturing facility 113 and to capture (e.g., pivotally)an end of the limb 163 extending from the beam 159. Preferably the frame157 comprises at least four legs 161, each leg 161 being located at oneof four corners of the frame 157. Those with skill in the art willrecognize that through the use of each leg 161 in a four-cornerarrangement, a high degree of adjustability to the elevation, pitch(e.g., y-axis rotation) and roll (e.g., x-axis rotation) of the frame157 is readily achievable. As well, the posture of the frame 157 itselfcan be adjusted for horizontal level or alignment with the vertical, asdescribed further below. Furthermore, the orientation of the high-speedwafer carrier handler 154 of the high-speed loader 107 can also beadjusted in this manner.

The frame 157 also may comprise a plurality of plates 167. For example,the plates 167 may be directly affixed to at least two of the beams 159where those beams 159 meet, and adapted to enhance the overall stiffnessof the frame 157.

The high-speed wafer carrier handler 154 may comprise a horizontal guide169 that is moveable vertically along two vertical guides 171. Thehorizontal guide 169 is mounted to each of the vertical guides 171 via amounting bracket 173. The high speed wafer carrier handler 154 furthercomprises an end effector 175 that is moveable horizontally along thehorizontal guide 169. The end effector 175 is mounted to the horizontalguide 169 via a mounting plate 177. The end effector 175 is adapted toreceive a wafer carrier 109 and to securely support that wafer carrier109 (e.g., from therebeneath) whether the end effector 175 is at rest oris moving (either vertically, or horizontally, or both vertically andhorizontally) in the x-z plane of FIG. 1A.

A controller 178 (shown in phantom in FIG. 1B) may be provided forcontrolling some or all of the operations of the wafer transportprocessing system 101, including automating all or a portion of thecalibration of the high speed loader 107 to the wafer carrier transportsystem 105 as described further below. The controller 178 may compriseone or more appropriately programmed computers, microcontrollers or thelike, logic hardware, or a combination of the same.

FIG. 2 is a side schematic view of the wafer carrier transport system105 that depicts an embodiment of the detectable feature 153. Eachdetectable feature 153 preferably comprises a plurality of slots 179.The two slots 179 shown in FIG. 2 comprise holes that perforate the band139 and have leading edges 180 that are substantially parallel to eachother and substantially perpendicular to the +x direction of rotation ofthe band 139. A distance 181 separates the leading edges 180 of theslots 179 and is measured along the +x direction of rotation of the band139. The distance 181 is preferably carefully controlled so as tofacilitate an accurate measurement of a speed of rotation of the band139 in the +x direction as will be explained further below.

FIG. 3 is a side schematic view of an upper portion of the wafer carrierprocessing system 101 that shows an embodiment of the high-speed loader107 that includes a launch sensor assembly 183 comprising a launchsensor 184. The launch sensor 184 is preferably adapted to detect eachslot 179 of each detectable feature 153, and to generate and transmit asignal corresponding to each detection of a slot 179. Thus the launchsensor 184 would provide a detection signal for the detectable feature153 that comprises two detection signals corresponding to the two slots179. Those with skill in the art will recognize that if the distance 181(FIG. 2) between the slots 179 is known and is subject to a tighttolerance, an instantaneous speed of rotation of the band 139 in the +xdirection over the high-speed loader 107 may readily be determined basedon the two-part signal generated in response to the movement of thedetectable feature 153 past the launch sensor assembly 183.

The launch sensor assembly 183 of FIG. 3 further comprises a frame 185to which the launch sensor 184, which comprises a first light source 187and a first detector 189, is affixed. The light source 187 is adapted toproject a first beam of light 191, and the detector 189 is aligned withthe light source 187 so as to detect the beam of light 191 when the band139 does not obstruct the beam of light 191. Because the light source187 and detector 189 of the launch sensor 184 occupy an elevationrelative to the wafer carrier transport system 105 corresponding to thatof the plurality of detectable features 153, each detectable feature 153represents a removal of the obstruction caused by the band 139. As such,as each detectable feature 153 reaches the beam of light 191 it permitsthe beam of light 191 to reach the detector 189, and thus detection ofthe detectable feature 153 is accomplished.

As described above, each detectable feature 153 corresponds to a wafercarrier support member 143, and so the detection of a detectable feature153 amounts to the detection of a wafer carrier support member 143. Thewafer carrier support member 143 is adapted to support and hold a wafercarrier 109 in a fixed position along the length of the band 139, so itis apparent that the instantaneous longitudinal position of a wafercarrier 109 supported by the wafer carrier support member 143 will alsohave been ascertained.

The launch sensor assembly 183 also preferably comprises a wafer carriersensor 192 comprising a second light source 193 affixed to the frame 185and adapted to project a second beam of light 195, and a second detector197 affixed to the frame 185 and aligned with the light source 193 andadapted to detect the beam of light 195. The wafer carrier sensor 192 isadapted to detect a wafer carrier 109 (when a wafer carrier 109 passesthe wafer carrier sensor 192) based on an interruption of the beam oflight 195 between the light source 193 and the detector 197.

The frame 185 may be coupled to the frame 157 via a plate 167 thatpasses beneath the wafer carrier transport system 105 and is located ata side of the high-speed loader 107 that is upstream relative to theflow of wafer carriers 109 being transported over the high-speed loader107 by the wafer carrier transport system 105 (see the upper-right plate167 of FIG. 1A). The connection between the frame 185 and the plate 167is preferably hinged so that the launch sensor assembly 183 may befolded within the frame 157 during gross movement of the frame 157 belowthe wafer carrier transport system 105 (e.g., during installation of thehigh-speed loader 107). Once the legs 161 are properly situated and theframe 157 is at least roughly aligned beneath the wafer carriertransport system 105, the frame 185 of the launch sensor assembly 183can be swung upward so that the launch sensor 184 assumes theorientation shown in FIG. 3.

In one embodiment of the wafer carrier processing system 101, thecontroller 178 (FIG. 1B) may be adapted to receive signals from thelaunch sensor 184 and adapted to determine from signals received fromthe launch sensor 184, a substantially instantaneous speed of rotationof the band 139 in the +x direction. In accordance with that embodiment,the launch sensor 184 generates a two-pulse signal as the detectablefeature 153 passes the launch sensor 184, each pulse of the two-pulsesignal including an indication that a leading edge 180 of a slot 179 hasjust passed the beam of light 191, and that the perforation formed bythe slot 179 is permitting the beam of light 191 to reach the detector189. Upon detecting the beam of light 191, the detector 189 preferablygenerates and transmits an indicating pulse to the controller 178 inreal time (e.g., the difference in time between the edge 180 reachingthe beam of light 191 and the controller 178 receiving the indicatorpulse is negligibly small for the purposes of the wafer carrierprocessing system 101), and the controller 178 notes the precise time itreceives the indicator pulse. Of course, the passage of the detectablefeature 153 will result in the controller 178 receiving two such pulsesseparated in time but in close succession.

The controller 178 may subtract the time of the first pulse from thetime of the second pulse to determine an inter-pulse time interval, andthen may determine the speed of rotation of the band 139 based on thedistance 181 and the inter-pulse time interval. Those with skill in theart will recognize that a controller may be caused to so determine thespeed of rotation of the band 139 in a number of different ways. Forexample, the controller 178 may calculate the speed by dividing thedistance 181 by the inter-pulse time interval. Alternatively, thecontroller 178 may make reference to a look-up table to perform theconversion, the look-up table being adapted to provide pre-calculatedspeed indications based on a constant distance 181. Additionally, adirect measure of band speed may be employed (e.g., via an encoder orthe like).

It is apparent that if the distance 181 associated with each pair ofdetectable features 153 is held to within a sufficiently tight toleranceof a known nominal distance value, and if that nominal distance value isrelatively short (e.g., as compared to the length of a wafer carrier109, or as compared to the distance between mounting positions ofsuccessive wafer carrier support members 143), the speed value sodetermined will be very close to an actual instantaneous speed ofrotation of the band 139. This will be particularly true if the wafercarrier transport system 105 is operated so as to provide a relativelyconstant speed of rotation for the band 139 over a long period of time.

FIG. 4 is a side schematic view of the high-speed wafer carrier handler154 of the high-speed loader 107 that illustrates an exemplaryembodiment 135 a of the mounting location 135 of FIGS. 1A-1C. As before,the horizontal guide 169 is mounted to the vertical guide 171 via themounting location 135 a for vertical motion along the vertical guide171. However, the mounting location 135 a may also be adapted to permitthe y-axis position of the horizontal guide 169 relative to the verticalguide 171 to be incrementally increased or decreased as necessary, e.g.,for purposes of fine-scale alignment of the horizontal guide 169 withthe first path portion 111 (FIG. 1B) through which the wafer carriertransport system 105 (FIG. 1B) is adapted to move the wafer carriers 109(FIG. 1B).

As shown in FIG. 4, the mounting location 135 a may comprise a firstshelf portion 199 moveably coupled to the vertical guide 171, and asecond shelf portion 201 fixedly coupled to the horizontal guide 169,and a thumbscrew 203 or other suitable mechanism. The thumbscrew 203 isembedded within the second shelf portion 201 and is adapted to permitthe second shelf portion 201 to move back and forth relative to thefirst shelf portion 199 along the y-axis, as indicated by the two-headedarrow 219. As the thumbscrew 203 is turned, the second shelf portion 201moves along the y-axis. Preferably, the horizontal guide 169 will bemounted to each of the vertical guides via a mounting bracket 173 a.Those skilled in the art will recognize that many potentialconfigurations of a mounting location 135 exist in addition to themounting location 135 a of FIG. 4 that will provide y-axis adjustmentfor the horizontal guide 169 relative to the vertical guide 171.

FIG. 5 is a schematic side view illustrating an end effector 175 risingto mate with a wafer carrier 109 as the wafer carrier 109 is supportedby the wafer carrier transport system 105 (e.g., during unloading of thewafer carrier 109 from the wafer carrier transport system 105). The endeffector 175 begins at a first elevation 221 relative to the wafercarrier transport system 105 (as shown in phantom) and rises in thedirection of the z-axis to a second elevation 223 relative to the wafercarrier transport system 105 shared by a wafer carrier 109, where akinematic interface (not shown) at the top of the end effector 175 maymate with a kinematic interface (not shown) at the bottom of the wafercarrier 109. A similar operation may be performed for loading a wafercarrier 109 onto the wafer carrier transport system 105.

Basic Process

FIG. 6 illustrates a flowchart of an exemplary process 600 forinstalling a high-speed loader 107 as part of an overall wafer carrierprocessing system 101 also comprising a wafer processing tool 103 and awafer carrier transport system 105. With reference to FIG. 6, theprocess 600 begins with step 601. In step 602, the high-speed loader 107(FIG. 1A) is aligned to the wafer processing tool 103 (FIG. 1C) and thewafer carrier transport system 105 (FIG. 1A) such that the high-speedwafer carrier handler 154 (FIG. 1B) of the high-speed loader 107 isproperly positioned and oriented relative to the factory interface 123of the wafer processing tool 103 and the wafer carrier transport system105 prior to calibration of the high-speed loader 107. The step 602 ofthe process 600 may itself comprise a separate and distinct process. Anexemplary embodiment of a process for performing step 602 is describedbelow with reference to the flow charts of FIGS. 7A-9 and the apparatusof FIGS. 10A-13.

In step 603, the high-speed loader 107 (FIG. 1A) is calibrated to thewafer processing tool 103 (FIG. 1C) and the wafer carrier transportsystem 105 (FIG. 1A) so that the high-speed wafer carrier handler 154(FIG. 1B) is rendered at least nominally operable within the overallwafer carrier processing system 101 (FIG. 1A) to exchange wafer carriers109 (FIG. 1A) with the wafer carrier transport system 105 (FIG. 1A),with the docking stations 127 (FIG. 1B) and/or with the storagelocations 135 (FIG. 1B). The step 603 of the process 600 may itselfcomprise a separate and distinct process. An exemplary embodiment of aprocess for performing step 603 is described below with reference to theflow charts of FIGS. 14-15 and the apparatus of FIGS. 16-18.

In step 604, the wafer carrier exchange functions of the high-speedloader 107 (FIG. 1A) with respect to the wafer carrier transport system105 (FIG. 1A), the docking stations 127 (FIG. 1A) and the storagelocations 135 (FIG. 1A) are tested. Preferably step 604 comprises atleast operating the high-speed wafer carrier handler 154 (FIG. 1A) toremove wafer carrier 109 from and place a wafer carrier 109 on at leastone wafer carrier support member 143 of the wafer carrier transportsystem 105, at least one docking station 127 of the factory interface123, and at least one wafer carrier storage location 135. More and/orother functional tests may be performed. If the high-speed wafer carrierhandler 154 performs these functions properly, the high-speed loader 107may be ready for placement into regular service as a component of thewafer carrier processing system 101.

In step 605, the high-speed loader 107 (FIG. 1A) is placed into serviceas a component of the wafer carrier processing system 101 (FIG. 1A). Inat least one embodiment, step 605 at least comprises providing anappropriate indication to the overall controller of the wafer carrierprocessing system 101 (e.g., the controller 178 or some othercontroller) such that the overall controller then establishes directcontrol over the relevant function of the high-speed loader 107. Step605 may also comprise, for example, advising the overall controller ofthe existence of any wafer carriers 109 (FIG. 1A) that occupy thedocking stations 127 (FIG. 1A) or the storage locations 135 (FIG. 1A) atthe time control over the high-speed loader 107 is turned over to theoverall controller. Such information may include the identity of thewafers (not shown) contained within each particular wafer carrier 109and the location of each of those wafer carriers 109.

In step 606, the process 600 concludes.

Overall HSL Alignment Process

FIGS. 7A-7B illustrate a flowchart of an exemplary process 700 foraligning a high-speed loader 107 (FIG. 1A) to the factory interface 123of a wafer processing tool 103 (FIG. 1C) and to a wafer carriertransport system 105 (FIG. 1B). With reference to FIG. 7, the process700 begins with step 701. In step 702, an approximate footprint position(not separately shown) for the high-speed loader 107 (FIG. 1A) isestablished.

The step 702 can comprise a separate process. However, an exemplaryprocess is described below. First, a wafer processing tool 103 (FIG. 1C)is identified that is intended to be served by a wafer carrier transportsystem 105 (FIG. 1B). Preferably the wafer processing tool 103 isoriented and/or adjusted as necessary so that the datum plate 129 (FIG.1C) of the factory interface 123 (FIG. 1C) of the wafer processing tool103 is properly prepositioned. For example, the shelf support panel 133(FIG. 1A) of the datum plate 129 can be aligned to the vertical and madeparallel to the first path portion 111 (FIG. 1B) through which the wafercarrier transport system 105 is adapted to transport wafer carriers 109,such that a predetermined horizontal offset (not shown) separates thefirst path portion 111 and the shelf support panel 133. The latter areprovisions intended to ensure that when the high-speed loader 107 (FIG.1A) is installed adjacent to the wafer processing tool 103, the endeffector 175 (FIG. 1B), the wafer carrier storage locations 135 (FIG.1B), and the docking stations 127 of the factory interface 123 will beoperable within, or will be finely adjustable to be operable within thesame x-z plane.

Next, the step 702 preferably comprises installing the high-speed loader107 (FIG. 1A) such that the feet 165 (FIG. 1B) of the elevationadjusting legs 161 (FIG. 1B) are firmly seated on the floor 115 (FIG.1A) of the manufacturing facility, and are at approximately the samedistance below the respective beams 159 from which the limbs 163associated with each foot 165 project. Such a provision provides auseful starting point for adjustment of the posture of the frame 157(FIG. 1A) of the high-speed loader 107 that at least nominally (if notactually) avoids twisting forces within the frame 157.

Next, the step 702 preferably comprises moving the frame 157 of thehigh-speed loader 107 (FIG. 1B) beneath the wafer carrier transportsystem 105 (FIG. 1B) and adjacent to the factory interface 123 of thewafer processing tool 103 (FIG. 1B) to a position on the floor 115 (FIG.1C) of the manufacturing facility 113 that is roughly equivalent towhere the high-speed loader 107 will fall after alignment to the waferprocessing tool 103 and the wafer carrier transport system 105 iscomplete. One way of grossly or coarsely positioning the high-speedloader 107 is to place the frame 157 (FIG. 1A) of the high-speed loader107 either directly against the factory interface 123 (FIG. 1A), oralternatively at a small distance from the factory interface 123, suchthat the docking stations 127 (FIG. 1A) of the factory interface 123protrude into the envelope of the frame 157 and are roughly centeredbetween adjacent sets of vertical beams 159 of the frame 157. Thedocking stations 127 may be prepositioned and pre-oriented relative tothe datum plate 129 (FIG. 1A) such that they are level with thehorizontal and extend substantially perpendicularly relative to thedatum surface 131 of the datum plate 129. Similarly, the storagelocations 135 (FIG. 1B), which also must protrude into the envelope ofthe frame 157 of the high-speed loader 107, may be positioned on theshelf support panel 133 (FIG. 1A) such that they are level with thehorizon and extend substantially perpendicularly relative to the datumsurface 131 of the datum plate 129. This assumes the storage locationsare mounted on the datum plate 129. Note that the storage locations mayalternatively be mounted on the frame 157 of the high speed loader 107,in which case they may be positioned as a unit.

As will be discussed more fully below, the datum plate 129 (FIG. 1A)and/or the shelf support panel 133 (FIG. 1A) may be horizontallyadjustable along the y-axis relative to both the wafer carrier transportsystem 105 (FIG. 1A) and the high-speed loader 107 (FIG. 1A) after finalalignment to ensure that the docking stations 127 (FIG. 1B) and thestorage locations 135 (FIG. 1A) occupy the same x-z plane as the endeffector 175 (FIG. 1A) of the high-speed wafer carrier handler 154 (FIG.1A).

More importantly for present purposes, however, is the selection of anappropriate x-axis position for the high-speed loader 107 (FIG. 1B)relative to the factory interface 123 (FIG. 1B). As was referred toabove, the x-axis position which centers the docking stations 127 withinthe frame 157 (FIG. 1B) of the high-speed loader 107 may generally bethe best x-axis position for the high-speed loader 107. Nevertheless, arange of permissible positions may exist, given the fact that thehigh-speed wafer carrier handler 154 (FIG. 1A) of the high-speed loader107 is adapted to be flexibly employed by the wafer carrier processingsystem 101 (FIG. 1B) to accomplish high-precision hand-offs atessentially any x-axis position along the range of motion of the endeffector 175 (FIG. 1A) along the horizontal guide 169 (FIG. 1A) of thehigh-speed wafer carrier handler 154. As such, the foregoing dockingstation-centering alignment may be accomplished by human eye for thesake of speed and simplicity (although more precise placement techniquesmay be used).

The step 702 further comprises confirming that the high-speed loader 107(FIG. 1C) is reasonably accurately situated in the x-y plane (e.g.,position and/or rotation) relative to the wafer carrier transport system105 (FIG. 1C). For example, the location of the frame 157 (FIG. 1C) ofthe high-speed loader 107 on the floor 115 (FIG. 1C) of themanufacturing facility 113 (FIG. 1B) may be visually checked to ensurethat the path of the end effector 175 (FIG. 1C) of the high-speed wafercarrier handler 154 (FIG. 1C) along the horizontal guide 169 (FIG. 1C)of the high-speed wafer carrier handler 154 is aligned beneath the firstpath portion 111 (FIG. 1C) through which the wafer carrier transportsystem 105 (FIG. 1C) is adapted to transport wafer carriers 109. If byvisual inspection this path-to-path horizontal alignment proves to beabsent, the frame 157 (FIG. 1A) of the high-speed loader 107 may bemoved and/or rotated within the x-y plane (e.g., the positions on thefloor 115 of the manufacturing facility at which the feet 165 of thelegs 161 of the frame 157 are seated may be changed) until the samevisual inspection yields a positive result.

It should be noted that although it is preferred that the first pathportion 111 be relatively long compared to the high-speed loader 107,the methods and apparatus of the present invention are equallyapplicable when the first path portion 111 comprises an x-axis length(not specifically shown) that is less than an x-axis length (notspecifically shown) of the high-speed loader 107, and/or less than anx-axis length (not separately shown) of a range of horizontal motion ofthe end effector 175 along the horizontal guide 169.

At the conclusion of the step 702 the footprint (not separately shown)of the high-speed loader 107 should be located at a position on thefloor 115 of the manufacturing facility 113 which approximates, to afairly high degree of accuracy (e.g., such as may be reasonably achievedvia use of the human eye), the position the footprint of the high-speedloader 107 will eventually occupy at the end of the process 700. It willbe understood, however, that the process 700 provides also forfine-tuning of the position and orientation of the high-speed loader 107as described below.

In step 703, a high precision level or similar device may be (directly)applied to each of the vertical guides 171 of the high-speed wafercarrier handler 154, and the legs 161 of the frame 157 of the high-speedloader 107 are adjusted so as to provide that both vertical guides 171,are simultaneously aligned with the vertical. Although, as will bedescribed later, the orientation of the vertical guides 171 may diverge,preferably slightly from vertical in the final aligned state of thehigh-speed loader 107, nevertheless in at least one embodiment of theprocess 700, the vertical guides 171 are inspected such that they arealigned with each other. Such a provision tends to ensure against thepossibility that unintended and avoidable x-axis twist will arise in thehorizontal guide 169 of the high-speed wafer carrier handler 154 laterin the process 700.

If significant adjustment of the posture of the frame 157 is necessaryto achieve simultaneous verticality in the vertical guides 171,periodically lifting an end of the frame 157 slightly to allow the legs161 at that end to shift position in the x-y plane on the floor 115 ofthe manufacturing facility 113 may avoid the buildup of undue stresswithin the frame 157.

Optionally, step 703 may additionally comprise applying a high-precisionlevel or similar device to the end effector 175 of the high-speed wafercarrier handler 154 to verify that, after the vertical guides 171 havebeen aligned with the vertical, the end effector 175 exhibits acorresponding degree of alignment with the horizontal.

In step 704, the frame 185 (FIG. 3) of the launch sensor assembly 183(FIG. 3) is set in its upright position as shown in FIG. 3 and the frame157 (FIG. 1A) is adjusted to assume an acceptable elevation relative tothe wafer carrier transport system 105. As the band 139 (FIG. 3) movesin the +x direction (e.g., into the paper), detectable features 153 movepast the x-axis position of the launch sensor 184 of the launch sensorassembly 183. The overall elevation of the frame 157 relative to thewafer carrier transport system 105 should be adjusted, preferably viathe adjustment of all of the legs 161 of the frame 157 in substantiallyequal measure, so that the beam of light 191 of the launch sensorassembly 183 reaches an elevation relative to the wafer carriertransport system 105 that is suitable for detection of the detectablefeatures 153 as they move past the launch sensor assembly 183. If arange of acceptable elevations exists, it may be preferable to set theelevation of beam of light 191 at or near the mid-point of that range,to ensure against the elevation of the beam of light 191 falling out ofthat range by the end of the process 700, e.g., because of interveningprocess steps which may call for additional adjustment of the positionsor the height of the legs 161 of the frame 157.

In step 705, the pitch (e.g., departure from alignment with thehorizontal as viewed along the y-axis) of the horizontal guide 169 (FIG.1B) of the high-speed wafer carrier handler 154 (FIG. 1A) may beadjusted so as to substantially match a pitch of the first path portion111 (FIG. 1B) through which the wafer carrier transport system 105 isadapted to transport wafer carriers 109. The step 705 may itselfcomprise a separate and distinct process. An exemplary embodiment of aprocess for performing step 705 is described below with primaryreference to the flow chart of FIG. 8, and the apparatus of FIGS.10A-10B and 11.

In step 706, the roll (e.g., departure from alignment with thehorizontal as viewed along the x-axis) of the horizontal guide 169 (FIG.1B) of the high-speed wafer carrier handler 154 (FIG. 1B) is adjusted soas to substantially eliminate roll about the x-axis. It should be notedthat the step 706 is not necessarily concerned with the type of x-axistwist which might cause the end effector 175 to execute what is known inaviation as a “barrel roll” as it moves along the horizontal guide 169.Rather, the step 706 is concerned with ensuring that, although thehorizontal guide 169 may be permitted to exhibit a non-negligible degreeof pitch as viewed along the y-axis, the horizontal guide 169nevertheless exhibits a horizontally-aligned or level aspect as viewedalong the x-axis.

To the extent that the horizontal guide 169 of the high-speed wafercarrier handler 154 guides the end effector 175 through a pitched path,it is apparent from the foregoing that there will preferably exist anon-tilted orientation for the horizontal guide 169 wherein it may, atthe same time as it guides the end effector 175 upward, maintain a levelor zero-roll condition in the end effector 175 throughout the climb.This is a goal of the step 705 and the step 706 of the process 700.

Proceeding with the description of the step 706, if the horizontal guide169 is in a non-zero roll condition the posture of the frame 157preferably is adjusted so that the horizontal guide 169 is reoriented toassume a non-zero roll condition. For this purpose a high-precisionlevel or similar device may be placed on the end effector 175 to revealwhether the end effector 175 is at least horizontally-oriented along the+x direction (e.g., zero roll). Preferably the end effector 175 is movedalong the horizontal guide 169 to determine if a non-zero roll angleexists. If a non-zero roll angle or offset exists, the posture of theframe 157 may be adjusted, for example, via adjusting the elevation ofthe frame 157 downward on one side of the band 139 of the wafer carriertransport system 105 by a certain extent, and/or adjusting the elevationof the frame 157 upward on the other side of the band 139 by the same ora similar extent, then rechecking for zero roll. Multiple suchadjustments should be undertaken if needed until zero roll is achieved.

In step 707, the pitch of the horizontal guide 169 of the high-speedwafer carrier handler 154 is checked against the possibility that theroll adjustments undertaken in the step 706 resulted in the pitch of thehorizontal guide 169, which was matched with that of the first pathportion 111 after the step 705, is now no longer so matched due to theroll adjustments of the step 706. If indeed the pitch of the horizontalguide 169 no longer matches the pitch of the first path portion 111, thestep 705 is repeated, and the step 706 is also repeated, followed by arecheck of the pitch of the horizontal guide 169. This cycle may repeatuntil the pitch of the horizontal guide 169 matches that of the firstpath portion 111 simultaneous with the roll of the horizontal guide 169being substantially zero, at which time the high-speed loader 107 willbe prepared for step 708.

In step 708, the y-axis position of the horizontal guide 169 (FIG. 1C)of the high-speed wafer carrier handler 154 (FIG. 1C) relative to thewafer carrier transport system 105 (FIG. 1C) is adjusted to eliminateany lateral displacement from a position beneath the wafer carriertransport system 105; and the orientation of the horizontal guide 169 isadjusted to eliminate any angular offset in the path through which thehorizontal guide 169 guides the end effector 175 that comprises non-zeroyaw (e.g., departure from vertical alignment with a vertically orientedplane containing the first path portion 111). For the purposes of thestep 708, it should be noted that numerous options exist in the mannerin which the y-axis position and the orientation of the horizontal guide169 are adjusted in order to satisfy the step 708. For example, oneoption includes moving the frame 157 relative to the floor 115 of themanufacturing facility 113. Another option includes moving thehorizontal guide 169 relative to the vertical guides 171 and thereforealso relative to the frame 157 of the high-speed loader 107.

The step 708 may comprise a separate and distinct process. An exemplaryembodiment of a process for performing the step 708 is described belowwith primary reference to FIG. 9, which illustrates a flowchart, andFIGS. 12A-B and 13, which illustrate apparatus. Once the step 708 iscomplete, the high-speed loader 107 is fully aligned with the waferprocessing tool 103 and the wafer carrier transport system 105, and isprepared for calibration to the same.

In step 709 the process 700 concludes.

HSL Pitch Adjustment

FIG. 8 illustrates a flowchart of an exemplary process 800 for adjustingthe orientation of the horizontal guide 169 (FIG. 1A) of the high-speedwafer carrier handler 154 so that the horizontal guide 169 exhibitspitch that matches the pitch of the first path portion 111 through whichthe wafer carrier transport system 105 is adapted to transport wafercarriers 109. FIGS. 10A-10B and FIG. 11 illustrate apparatus relevant tothe process 800.

FIG. 10A is a schematic front view of the horizontal guide 169 and theend effector 175 of FIGS. 1A-1C, and of the first path portion 111through which the wafer carrier transport system 105 (FIG. 1A) isadapted to transport wafer carriers 109, wherein the pitch of the firstpath portion 111 and the pitch of the horizontal guide 169 do not match.FIG. 10B is a schematic front view of the horizontal guide 169, the endeffector 175, and the first path portion 111 that is similar to that ofFIG. 10A, except that in the view of FIG. 10B the pitch of the firstpath portion 111 and the pitch of the horizontal guide 169 match. FIG.11 is a schematic side view of the high-speed loader 107 of FIGS. 1A-1C,wherein a side-looking sensor, preferably mounted to the end effector175 of the high-speed wafer carrier handler 154 is adapted to detect adetectable feature of and/or associated with the wafer carrier transportsystem 105 when the end effector 175 is positioned at a predefinableelevation relative to the wafer carrier transport system 105.

With reference to FIGS. 8, 10A-10B and 11, the process 800 begins withstep 801. In step 802, a side-looking sensor assembly 225 is mounted tothe end effector 175 of the high-speed wafer carrier handler 154, asshown in FIG. 11. The sensor assembly 225 is adapted to detect adetectable feature 227 of and/or associated with the wafer carriertransport system 105 which, in the embodiment of FIG. 11, comprises abottom edge 228 of the band 139 of the wafer carrier transport system105.

In step 803, the end effector 175 is positioned at a predefined zeropoint along the length of the horizontal guide 169 referred to hereafteras the “horizontal zero” of the high-speed wafer carrier handler 154. Inone embodiment, the horizontal zero is a point along the range of motionof the end effector 175 along the horizontal guide 169 that issubstantially close to the upstream-most point along that range(reference numeral 233 in FIG. 10A). Such a position may maximize theuseable “runway” length of the horizontal guide 169 so that thehorizontal guide 169 can support increasingly higher wafer carrierexchange velocities.

In step 804 the end effector 175, which is held motionless by thehorizontal guide 169 at the position 233 or horizontal zero, and thehorizontal guide 169 are moved together (i.e., as a unit) vertically upor down along each of the vertical guides 171 (FIG. 11) in equalmeasure.

In step 805, a side-looking sensor 243 (FIG. 11) of the sensor assembly225 (FIG. 11), which is adapted to detect the detectable feature 227when the detectable feature 227 is aligned with the sensor 243, detectsthe detectable feature 227. For example, the sensor 243 of the sensorassembly 225 may generate a signal in response to said detection (e.g.,and provide the signal to the controller 178 (FIG. 1B)).

In step 806 the end effector 175 is moved from the position it occupiedalong the length of the horizontal guide 169 during steps 804 and 805,which preferably comprised the position 233 or horizontal zero, to adifferent position along the length of the horizontal guide 169 (e.g.,downstream of the position 233). For example, the end effector 175 maybe moved to a point 235 near the end of the range of travel of the endeffector 175 opposite the end associated with the position 233 orhorizontal zero. (In step 806, the horizontal guide 169 preferably ispositioned at the same vertical guide position it occupied at theinstant of detection of the detectable feature 227 during step 805.)

In step 807, the end effector 175 is again held motionless by thehorizontal guide 169, this time at the downstream position 235 as shownin FIGS. 10A-10B. If needed, the posture of the frame 157 of thehigh-speed loader 107 is then adjusted (e.g., by adjusting the length oflegs 161 (FIG. 1B) sufficiently to cause the sensor 243, now moved, toagain detect the detectable feature 227.

In step 808, the sensor 243, as it did in step 805, again detects thedetectable feature 227 and generates a signal indicating said detection,and the posture adjustment of the frame 157 is stopped coincident withsaid detection. For example, the sensor 243 may provide the generatedsignal to the controller 178 (FIG. 1B).

Those possessing skill in the art will recognize other methods ofcausing the downstream detection to occur and thus to complete theprocess 800. For example, shims may be introduced beneath the downstreamend of the frame 157. Alternatively, the orientation of the verticalguides 171 may be adjusted as a unit relative to the frame 157 of thehigh-speed loader 107.

The side-looking sensor employed in the process 800 need not be used toobserve a detectable feature that is formed by or part of the band 139of the wafer carrier transport system 105 as illustrated in FIG. 10. Adetectable feature of a wafer carrier support member 143 of the wafercarrier transport system 105 may be utilized. So may a detectablefeature of a wafer carrier 109 or a detectable feature of the wafercarrier transport system 105 that does not move with the band 139, e.g.,an extension of a support frame (not shown) that extends downward. It ispreferred that, as with the axis 245 of the sensor 243, the side-lookingsensor employed in the process 800 is aligned with the horizontal guide169 so that when the end effector 175 is set at zero roll the alignmentof the side-looking sensor is substantially level to the horizon. Anysuitable sensor type may be used (e.g., reflective, through beam, etc.)

HSL Yaw and Y-Axis Displacement Adjustment

FIG. 9 illustrates a flowchart of an exemplary process 900 for adjustingthe y-axis position and yaw orientation of the horizontal guide 169(FIG. 1C) of the high-speed wafer carrier handler 154 (FIG. 1C) of thehigh-speed loader 107 (FIG. 1C) so that the horizontal guide 169 isaligned beneath the wafer carrier transport system 105 and the path 237(FIG. 12) of the end effector 175 is aligned within avertically-oriented plane containing the first path portion 111 (e.g.,zero yaw offset). FIG. 13 illustrates apparatus relevant to the process900.

FIG. 13 is a schematic side view of the high-speed loader 107 of FIGS.1A-1C, wherein an upward-looking sensor, preferably mounted to the endeffector 175 of the high-speed wafer carrier handler 154, is adapted todetect a detectable feature of or associated with the wafer carriertransport system 105 when the end effector 175 is properly alignedbeneath the first path portion 111.

With reference to FIGS. 9 and 13, the process 900 begins with step 901.In step 902, an upward-looking sensor assembly 247 is mounted to the endeffector 175 of the high-speed wafer carrier handler 154 as shown inFIG. 13. The assembly 247 is adapted to detect a detectable feature 249of or associated with the wafer carrier transport system 105, which inthe embodiment of FIG. 13 comprises a downward facing surface 251 of theband 139 of the wafer carrier transport system 105.

In step 903, the end effector 175 is positioned at the horizontal zeroor position 233 (FIG. 12A) of the horizontal guide 169. In step 904, they-axis position of the upstream end of the frame 157 (e.g., the end ofthe frame 157 at which the end effector 175 is positioned) is adjustedrelative to the floor 115 of the manufacturing facility 113, and to thewafer carrier transport system 105.

In step 905, an upward looking sensor 253 of the assembly 247 (FIG. 13),which is adapted to detect the feature 249 when the feature 249 isaligned with the sensor 253, detects the feature 249. For example, thesensor 253 generates a signal in response to said detection, and inresponse thereto, the y-axis movement of the upstream end of the frame157 is ceased (e.g., automatically or by an operator). For example, thecontroller 178 (FIG. 1B) may receive the generated signal and causey-axis movement of the frame 157 to halt (e.g., by generating a warningto an operator, by halting a motor (not shown) that moves the frame 157,etc.).

In step 906, the end effector 175 is moved from the position 233 to theposition 235 at the opposite end of the horizontal guide 169 (FIG. 12A).

In step 907, the end effector 175 is again held motionless by thehorizontal guide 169, this time at the downstream position 235 as shownin FIGS. 12A-12B. The y-axis position of the downstream end of the frame157 (e.g., the end of the frame 157 at which the end effector 175 is nowpositioned) is adjusted relative to the floor 115 of the manufacturingfacility 113, and to the wafer carrier transport system 105,sufficiently to cause the sensor 253, now moved, to again detect thefeature 249.

In step 908, the sensor 253, as it did in the step 905, again detectsthe feature 249 and generates a signal indicating said detection (whichmay cause the y-axis movement of the downstream end of the frame 157 tocease, such as via the controller 178 as described above). Thehorizontal guide 169 is now properly aligned beneath the wafer carriertransport system 105 such that the path 237 is aligned with avertically-oriented plane containing the first path portion 111, and thehigh-speed loader 107 is ready for calibration to the wafer processingtool 103 and to the wafer carrier transport system 105.

In step 909, the process 900 concludes.

The upward-looking sensor employed in the process 900 need not be usedto observe a detectable feature that is formed by part of the band 139of the wafer carrier transport system 105 as illustrated in FIG. 13. Forexample, a detectable feature of a wafer carrier 109 may be utilized, asmay a detectable feature of the wafer carrier transport system 105 thatdoes not move with the band 139, e.g., an extension of a support frame(not shown) that extends downward. In addition, sensors facing bothupward and to the side may be utilized for the purposes of the process900. Any suitable sensor type may be used (e.g., reflective, throughbeam, etc.)

Referring again to FIG. 4, the mounting shelf 173 a permits y-axismotion of the horizontal guide 169 relative to the vertical guide 171and thereby also relative to the frame 157 (as described previously).Rather than undertake to adjust the position of the frame 157 relativeto the floor 115 of the manufacturing facility 113 as the sole means toachieve the alignment of the horizontal guide 169 beneath the wafercarrier transport system 105 and of the path 237 within avertically-oriented plane containing the first path portion 111, onemay, when sufficiently close to final alignment, choose instead tofinely adjust the position of the horizontal guide 169 relative to thevertical guide 171 to arrive at the desired degree of y-axis and yawprecision.

Establishing HSL End Effector Vertical Zero

FIG. 14 illustrates a flow chart of an exemplary process 1400 forestablishing an elevation of the end effector 175 of the high-speedloader 107 relative to the wafer carrier transport system 105 as a“vertical zero” for the end effector 175 at which the end effector 175may be caused to dwell, e.g., during the time just prior to a wafercarrier exchange launch. At least two distinct elevations may be soestablished, one such elevation corresponding to a suitable elevationfor the end effector 175 to dwell when awaiting an opportunity to placea wafer carrier 109 on the wafer carrier transport system 105, andanother such elevation corresponding to a suitable elevation for the endeffector 175 to dwell when awaiting the opportunity to remove a wafercarrier 109 from the wafer carrier transport system 105. The formerelevation will generally be lower than the latter, since the wafercarrier 109 awaiting placement will need to be supported at a low enoughelevation to preclude contact between that wafer carrier to be loadedonto the wafer carrier transport system 105 and the other wafer carriers109 being transported overhead by the wafer carrier transport system105. By contrast, the latter elevation may be higher since no wafercarrier 109 is being supported by the end effector 175 that requiressuch clearance. Nevertheless, the process 1400 may be utilized forestablishing a vertical zero for either or both functions, and FIGS.16-17 illustrate apparatus relevant to the process 1400.

FIGS. 16 and 17 are schematic side views of the high-speed loader 107 ofFIGS. 1A-1C, wherein a side-looking sensor, preferably mounted to theend effector 175 of the high-speed wafer carrier handler 154, is adaptedto detect a detectable feature of and/or associated with the wafercarrier transport system 105 when the end effector 175 is at apredefinable elevation relative to the wafer carrier transport system105.

With reference to FIGS. 14, 16 and 17, the process 1400 begins with step1401. In step 1402, a side-looking sensor assembly 257 is mounted to theend effector 175 of the high-speed wafer carrier handler 154 as shown inFIG. 16. The sensor assembly 257 is adapted to detect a detectablefeature 259 of and/or associated with the wafer carrier transport system105, which in the exemplary embodiment of FIG. 16, comprises a surface261 of the wafer carrier support member 143 of the wafer carriertransport system 105.

In step 1403, the end effector 175 and the horizontal guide 169 of thehigh-speed wafer carrier handler 154 are moved vertically relative tothe vertical guides 171 and to the wafer carrier transport system 105.

In step 1404, a side-looking sensor 263 (FIG. 16) of the sensor assembly257 (FIG. 16), which is adapted to detect the feature 259 when thefeature 259 is aligned with an axis 265 defined by the sensor 263,detects the feature 259. Preferably the sensor 263 generates a signal inresponse to said detection. The controller 178 (FIG. 1B) may receive thegenerated signal.

In step 1405, the controller 178 of the wafer carrier processing system101 (FIG. 16) determines, based on the signal from the sensor 263, theposition along the vertical guides 171 occupied by the horizontal guide169 when the sensor 263 detected the feature 259. The sensor assembly257 is geometrically configured to cause the sensor 263 to detect thefeature 259 when the end effector 175 is at an elevation relative to thewafer carrier transport system 105 that is suitable for establishment ofthe vertical zero of the end effector 175. The controller 178 preferablystores a value corresponding to the position of the horizontal guide 169relative to the vertical guides 171 when detection takes place, suchthat whenever the end effector 175 must be positioned at its verticalzero, the controller 178 may determine the value and properly positionthe horizontal guide 169.

In step 1406, the process 1400 concludes.

Although it is preferred that the sensor assembly 257 be coupled to theend effector 175 for the purposes of the process 1400, it will berecognized by those possessing skill in the art that other couplingpositions be selected. For example, the sensor assembly 257 may becoupled directly to the horizontal guide 169, or to the mounting plate177. Note that the wafer carrier processing system 101 may be adapted toautomatically “teach” itself the vertical zero elevation via the signalfrom the sensor 263 (and/or with the controller 178).

Referring to FIG. 17, the sensor 263 of the sensor assembly 257 may alsobe employed to detect a feature 259 that is part of a wafer carrier 109transported by the wafer carrier transport system 105. The feature 259of FIG. 17 comprises a surface 267 of the wafer carrier 109.

Note that based on the vertical zero determined for the horizontal guide169 when a wafer carrier 109 is not present on the end effector 175(process 1400), the vertical zero for the horizontal guide 169 when awafer carrier is present on the end effector 175 can be easilydetermined (e.g., manually or automatically) if the thickness of thewafer carrier 109 is known.

Establishing HSL End Effector Horizontal Launch Offset

FIG. 15 illustrates a flow chart of an exemplary process 1500 forestablishing a “horizontal launch offset” of the end effector 175 of thehigh-speed loader 107 relative to the launch sensor 184 (FIG. 3). Aknowledge of the horizontal launch offset allows the wafer carrierprocessing system 101 to properly time wafer carrier exchange launchesof the end effector 175.

The horizontal launch offset of a high-speed loader 107 can comprise orotherwise be related to the span of time between the time a given pointon the wafer carrier transport system 105 passes the launch sensor 184,and time that point of the wafer carrier transport system 105 passes theposition 233 or horizontal zero of the end effector 175 (e.g., for agiven speed of the wafer carrier transport system 105). The horizontallaunch offset may alternatively comprise or be based on the actualdistance along the x-axis between the launch sensor 184 and the position233 or horizontal zero of the end effector 175.

With reference to FIGS. 3, 11 and 15, the process 1500 begins with step1501. In step 1502, a side-looking sensor assembly, e.g., the sensorassembly 225 of FIG. 11, is mounted to the end effector 175 (FIG. 11).The sensor assembly 225 is adapted to detect a detectable feature 227 ofand/or associated with the wafer carrier transport system 105.Preferably the sensor assembly 225 is adapted to detect the detectablefeatures 153 (FIG. 3) comprising slots 179 cut into the band 139.

In step 1503, the launch sensor of the high-speed loader 107, e.g., thelaunch sensor 184 of FIG. 3, detects a detectable feature 153 of thewafer carrier transport system 105 as it passes the launch sensor 184,and generates a signal. The generated signal may be provided to thecontroller 178 (FIG. 1B). The step 1503 may be performed in accordancewith the method described above with reference to FIG. 3.

In step 1504, the sensor 243 (FIG. 11) of the sensor assembly 225detects the same detectable feature 153 detected during the step 1503 bythe launch sensor 184, and generates a signal. The generated signal maybe provided to the controller 178 (FIG. 1B). The step 1504 may beperformed in accordance with the method described above with referenceto FIG. 3.

In step 1505, a horizontal launch offset for the end effector 175 of thehigh-speed loader 107 is determined based on the signals of the step1503 and the step 1504. For example, based on the time between the twosignals, the distance between the sensors 184 and 243 and/or knowledgeof the speed of the wafer carrier transport system 105, the horizontallaunch offset may be easily determined (e.g., automatically via thecontroller 178).

In step 1506, the process 1500 concludes. Although the process 1500involved the detection of the same detectable feature 153 twice,exemplary embodiments of processes adapted to perform the same functionas the process 1500 in accordance with the present invention includedetecting two separate detectable features, either of which may or maynot be a detectable feature 153. Other types of sensors may be employedas may other detectable features of a wafer carrier 109, reflectivesurfaces, etc.

Additional Details

Referring back to FIG. 6 and the process 600 of the flow chartillustrated thereby, the step 603 preferably comprises calibrating thehigh-speed wafer carrier handler 154 of the high-speed loader 107 toeach wafer carrier storage location 135 and docking station 127 of thefactory interface 123 of the wafer processing tool 103. FIG. 18 is aperspective schematic view of a sensor assembly adapted to detectdetectable features of a shelf or other storage location and generatesignals for determining a position of the shelf and/or docking stationin the x-z plane. In the embodiment shown, a sensor assembly 269comprises a side-looking sensor 271 coupled to the end effector 175 (notshown) adapted to detect detectable features 273 of a shelf 275 (e.g., areflective feature such as a flat region of the shelf/docking station).The sensor 271 is adapted to generate a signal in response to detectinga detectable feature 273 and such a signal may be provided to thecontroller 178 (FIG. 1B).

When caused to pass a detectable feature 273 in the z-axis direction sothat the sensor 271 aligns with the detectable features 273, the sensor271 is adapted to generate a signal, thus enabling a position of theshelf along the z-axis to be determined. When caused to pass adetectable feature 273 in the x-axis direction so that the axis 277 ofthe sensor 271 aligns with the detectable feature 273, the sensor 271 isadapted to generate a signal to enable a position of the shelf along thex-axis to be determined. The detectable features 273 alternatively (oradditionally) can comprise a part of a docking station 127 fordetermination of an x-z position of the docking station by a sensor 271coupled to the end effector 175. In this way, the x-z positions of eachwafer carrier storage location 135 (FIG. 1A) and each docking station127 (FIG. 1A) of the factory interface 123 may be determined by thewafer carrier processing system 101, and the calibration of thehigh-speed loader 107 to the wafer processing tool 103 will be complete.The thickness and/or width of each shelf and/or docking station may bedetermined based on when the sensor 271 first detects a detectablefeature 273 relative to when the sensor 271 stops detecting thedetectable feature 273 as the sensor 271 moves past the detectablefeature 273. Any suitable sensor configuration may be employed (e.g.,reflection based, through beam, etc.)

FIG. 19 is a top schematic view of a shelf support panel 133 having twostorage locations 135, and of the end effector 175, the horizontal guide169, and the path 237 through which the horizontal guide 169 is adaptedto guide the end effector 175. If desired, a y-axis position of theshelf support panel 133 relative to the path 237 may be adjusted (e.g.,between a first position 279 and second position 281). The datum surface131 (FIG. 1A) may be similarly adjusted for purposes of adjustingmoveable portions (e.g., shelves 155) of the docking stations 127 tomore closely align with the x-z plane. It should also be noted that ifthe shelf support panel 133 were mounted to the frame 157 of thehigh-speed loader 107 instead of the datum surface 131 of the factoryinterface 123, a similar adjustment may be used.

The foregoing description discloses only exemplary embodiments of theinvention. Modifications of the above disclosed apparatus and methodswhich fall within the scope of the invention will be readily apparent tothose of ordinary skill in the art. For instance, the sensor 243 (FIG.11) and/or the sensor 253 (FIG. 13) can be any one of any number ofsensors respectively adapted for the purpose of detecting the detectablefeature 227 (FIG. 11) and the detectable feature 249 (FIG. 13). Forexample, a sensor may be utilized that is adapted to transmit a lightbeam along an axis and detect a reflection of (or the termination of areflection of) that light beam. Alternatively, an optical-eye typesensor, or a through-beam sensor, may be utilized.

While the present invention has been described primarily with referenceto wafers, it will be understood that the invention also may be employedwith other substrates such as a silicon substrate, a glass plate, amask, a reticule, etc., whether patterned or unpatterned; and/or withother apparatus for transporting and/or processing such substrates.

Any of the adjustments described herein may be performed manually, undercomputer control (e.g., under direction of the controller 178), or by acombination of the same. For example, one or more motors or otheradjustment devices may be used to adjust the position of the high speedloader 107 (as described above) under control of an operator and/or thecontroller 178. Likewise, the controller 178 may include computerprogram code for carrying out or otherwise affecting one or more of theprocesses 600, 700, 800, 900, 1400, 1500, etc., described herein.

Accordingly, while the present invention has been disclosed inconnection with exemplary embodiments thereof, it should be understoodthat other embodiments may fall within the spirit and scope of theinvention, as defined by the following claims.

1. A method of calibrating a substrate carrier loader to a movingconveyor comprising: providing a substrate carrier loader adapted toload substrate carriers onto a moving conveyor; aligning the substratecarrier loader to the moving conveyor; and calibrating the substratecarrier loader to the moving conveyor.
 2. The method of claim 1 whereinthe substrate carrier loader is further adapted to unload substratecarriers from the moving conveyor.
 3. The method of claim 1 furthercomprising testing operation of the substrate carrier loader.
 4. Themethod of claim 3 wherein testing operation of the substrate carrierloader includes operating the substrate carrier loader to place asubstrate carrier on at least one carrier support member of the movingconveyor.
 5. The method of claim 4 wherein testing operation of thesubstrate carrier loader further comprises operating the substratecarrier loader to remove a substrate carrier from at least one carriersupport member of the moving conveyor.
 6. The method of claim 4 whereintesting operation of the substrate carrier loader further comprisesloading a substrate carrier on a docking station or a substrate carrierstorage location.
 7. The method of claim 1 further comprising placingthe substrate carrier loader into service such that the substratecarrier loader may load substrate carriers onto and remove substratecarriers from the moving conveyor.
 8. The method of claim 1 whereinaligning the substrate carrier loader to the moving conveyor comprises:establishing a footprint position of the substrate carrier loader;establishing a level of the substrate carrier loader at the footprintposition; and establishing a frame height of the substrate carrierloader at the footprint position.
 9. The method of claim 8 furthercomprising adjusting a pitch of a travel path of an end effector of thesubstrate carrier loader based on a pitch of the moving conveyor. 10.The method of claim 9 wherein adjusting a pitch of a travel path of anend effector of the substrate carrier loader based on a pitch of themoving conveyor comprises: using a sensor to detect a detectable featureof the moving conveyor at a first end of the travel path of the endeffector of the substrate carrier loader; moving the end effector to asecond end of the travel path of the end effector; and adjusting anelevation of the substrate carrier loader at the second end of thetravel path of the end effector so that the sensor detects a detectablefeature of the moving conveyor at the second end of the travel path ofthe end effector.
 11. The method of claim 9 further comprising adjustinga roll of the travel path of the end effector of the substrate carrierloader.
 12. The method of claim 11 further comprising adjusting alateral position of the travel path of the end effector of the substratecarrier loader based on a lateral position of the moving conveyor. 13.The method of claim 12 wherein adjusting a lateral position of thetravel path of the end effector of the substrate carrier loadercomprises: adjusting a lateral position of the substrate carrier loaderat a first end of the travel path of the end effector so that a sensordetects a detectable feature of the moving conveyor at the first end ofthe travel path of the end effector; moving the end effector to a secondend of the travel path of the end effector; and adjusting a lateralposition of the substrate carrier loader at the second end of the travelpath of the end effector so that the sensor detects a detectable featureof the moving conveyor at the second end of the travel path of the endeffector.
 14. The method of claim 11 further comprising adjusting a yawof the travel path of the end effector of the substrate carrier loader.15. The method of claim 1 wherein calibrating the substrate carrierloader to the moving conveyor comprises determining a vertical zero foran end effector of the substrate carrier loader relative to the movingconveyor, the vertical zero representing a height at which the endeffector of the substrate carrier loader is positioned prior to loadinga substrate carrier onto the moving conveyor or prior to removing asubstrate carrier from the moving conveyor.
 16. The method of claim 1wherein calibrating the substrate carrier loader to the moving conveyorcomprises determining a horizontal launch offset for an end effector ofthe substrate carrier loader relative to the moving conveyor, thehorizontal launch offset allowing a determination of when the endeffector of the substrate carrier loader is to be launched to: load asubstrate carrier onto the moving conveyor after a position for thesubstrate carrier on the moving conveyor is located; or remove asubstrate carrier from the moving conveyor after the substrate carrieris located on the moving conveyor.
 17. The method of claim 1 furthercomprising calibrating the substrate carrier loader to a docking stationof a processing tool.
 18. A method of calibrating a substrate carrierloader to a moving conveyor comprising: providing a substrate carrierloader adapted to load substrate carriers onto a moving conveyor;establishing a footprint position of the substrate carrier loaderrelative to the moving conveyor; establishing a level of the substratecarrier loader at the footprint position; establishing a frame height ofthe substrate carrier loader at the footprint position; and if needed:adjusting a pitch of a travel path of an end effector of the substratecarrier loader based on a pitch of the moving conveyor; adjusting a rollof the travel path of the end effector of the substrate carrier loader;adjusting a lateral position of the travel path of the end effector ofthe substrate carrier loader based on a lateral position of the movingconveyor; or adjusting a yaw of the travel path of the end effector ofthe substrate carrier loader.
 19. A system comprising: a substratecarrier loader adapted to load substrate carriers onto a movingconveyor; and a controller coupled to the substrate carrier loader, thecontroller adapted to assist in: alignment of the substrate carrierloader to the moving conveyor; and calibration of the substrate carrierloader to the moving conveyor.
 20. The system of claim 19 wherein thecontroller is adapted to detect detectable features of the movingconveyor so as to assist in: adjustment of a pitch of a travel path ofan end effector of the substrate carrier loader based on a pitch of themoving conveyor; or adjustment of a lateral position of the travel pathof the end effector of the substrate carrier loader based on a lateralposition of the moving conveyor.